Kevin Brown Method
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The original KBM article was delivered in e-mail form, outlining a simple set of instructions that enabled a polishing enthusiast to drastically increase the cutting and finishing performance of a typical random orbital polisher.
The KBM dictates that the simplest aspects of polishing are continuously considered or calibrated, including: frequent pad cleaning (to control paint residue build-up); the targeted use of a supplemental wetting agent (to extend the use of a single application of buffing liquid, to better distribute buffing liquid across the pad face, to increase cut); the implementation of machine tilt or the targeted addition of user-applied pressure (to equalize pressure across the pad face, to minimize the percentage of pad face contacting the polishing area, to increase the width of the pad's contact patch across a curved or crowned panel shape); the use of low polishing speed (for smooth, controlled, and comfortable machine operation, for lower pad and panel temperatures, and to allow more time for the pad to conform to the polishing surface, particularly when user-applied pressure or machine tilt is increased).
Related: Cleaning, Cutting, Finishing, Polish, Polisher
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